Advanced process technologies for photonics waveguide patterning

Erik Geiss; Massud Aminpur; Ryan Sporer; Vijayalakshmi Seshachalam; Padraig R. Timoney; Brendan O'Brien; Josh LaRose; Eitan Barlaz; Cameron Werner; Katie Lutker-Lee; Luis Fernandez; Brian Pfeifer; Chimaobi Mbanaso; Yan Shao; Angélique Raley

doi:10.1117/12.2657729

20 June 2023 Advanced process technologies for photonics waveguide patterning

Erik Geiss, Massud Aminpur, Ryan Sporer, Vijayalakshmi Seshachalam, Padraig R. Timoney, Brendan O'Brien, Josh LaRose, Eitan Barlaz, Cameron Werner, Katie Lutker-Lee, Luis Fernandez, Brian Pfeifer, Chimaobi Mbanaso, Yan Shao, Angélique Raley

Author Affiliations +

Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC124990B (2023) https://doi.org/10.1117/12.2657729
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Silicon photonics platforms leveraging 300mm manufacturing fabrication plants is a growing sector. This trend will continue as the demand for energy efficient data centers, advanced quantum computing architectures and AR/VR drive demand forward. GlobalFoundries is at the forefront of advanced photonics platforms implementation and have recently announced it is collaborating with industry leaders to deliver innovative, unique, feature-rich solutions to solve some of the biggest challenges facing data centers today. In this paper we investigate the impact of process manufacturing techniques typically used in advanced logic and memory on photonics waveguides uniformity improvement and smoothing. Some focus will be placed on the patterning process itself investigating effects of plasma VUV cure, direct current superposition and area selective deposition on resist for downstream line edge roughness and line width roughness impact. We will also review impact of silicon nitride film uniformity and top roughness smoothing on final waveguide optical performance. While silicon photonics features are much larger than logic features, process requirements to achieve required optical performance are stringent and will require innovative solutions to continue driving down optical losses.

Conference Presentation

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Erik Geiss, Massud Aminpur, Ryan Sporer, Vijayalakshmi Seshachalam, Padraig R. Timoney, Brendan O'Brien, Josh LaRose, Eitan Barlaz, Cameron Werner, Katie Lutker-Lee, Luis Fernandez, Brian Pfeifer, Chimaobi Mbanaso, Yan Shao, and Angélique Raley "Advanced process technologies for photonics waveguide patterning", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990B (20 June 2023); https://doi.org/10.1117/12.2657729

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