Paper
1 January 1988 Chemical Reactions Induced By Soft X-Ray And E-Beam Exposure Of Novolac-Based Resists
Derrick C. Mancini, James W. Taylor, T. V. Jayaraman, Richard J. West
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Abstract
X-ray exposure of selected novolac resins and commercial novolac-based resists show more varied end products and more crosslinking reactions than observed in the UV exposure. E-beam and x-ray induced reactions are somewhat similar. Novolac resin without the photoactive component (PAC) was shown to crosslink suggesting that x-ray and e-beam mechanisms must take this into account. Difference FTIR spectra were indicative of the structural changes. Mass spectrometry was less effective because of the volatility of PAC, although novolac resin without PAC was shown to contribute to the gaseous byproducts of exposure. The role of crosslinking of the novolac resin in process latitude and image reversal is discussed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Derrick C. Mancini, James W. Taylor, T. V. Jayaraman, and Richard J. West "Chemical Reactions Induced By Soft X-Ray And E-Beam Exposure Of Novolac-Based Resists", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968338
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CITATIONS
Cited by 2 scholarly publications and 1 patent.
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KEYWORDS
Picture Archiving and Communication System

X-rays

Ultraviolet radiation

Image processing

FT-IR spectroscopy

Absorption

Semiconducting wafers

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