Paper
5 November 2020 Sub-aperture optical system testing by using of a modified simulateous fit method
Author Affiliations +
Proceedings Volume 11568, AOPC 2020: Optics Ultra Precision Manufacturing and Testing; 115681C (2020) https://doi.org/10.1117/12.2579949
Event: Applied Optics and Photonics China (AOPC 2020), 2020, Beijing, China
Abstract
Sub-aperture stitching interferometry can be used for measurement of wavefront of large aperture optical system. A variety of sub-aperture stitching algorithms have been studied to reconstruct the sub-aperture data to obtain full aperture wavefront. The simultaneous fitting method plays an important role among those stitching algorithms which uses a series of global polynomials to accomplish the fitting of the test wavefronts, however, it can only be applied in the case of there have no overlap between each sub-apertures. Therefore, a modified simultaneous fitting method is proposed and is applied to measure the wavefront of large aperture optical system. The proposed algorithm is applicable whether there exists overlap between each sub-aperture or not. The numerical simulation is carried out to evaluate the accuracy of the algorithm. Further, a practical stitching experiment that test an optical system with a diameter of 850mm was implemented to demonstrate the modified algorithm.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kewei E., Jianke Zhao, Tao Wang, Zhengfeng Wang, Kai Liu, Ming Chang, and Yan Zhou "Sub-aperture optical system testing by using of a modified simulateous fit method", Proc. SPIE 11568, AOPC 2020: Optics Ultra Precision Manufacturing and Testing, 115681C (5 November 2020); https://doi.org/10.1117/12.2579949
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KEYWORDS
Wavefronts

Computer simulations

Optical testing

Algorithm development

Mirrors

Imaging systems

Reconstruction algorithms

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