Method to improve the overlay image contrast and optimize the sub-segmentation mark

Libin Zhang; Cong Lu; Yaobin Feng; Yayi Wei

doi:10.1117/12.2583820

22 February 2021 Method to improve the overlay image contrast and optimize the sub-segmentation mark

Libin Zhang, Cong Lu, Yaobin Feng, Yayi Wei

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 1161131 (2021) https://doi.org/10.1117/12.2583820
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

Overlay marks contrast plays such a fundamental role for the overlay metrology that it dominants the accuracy control and draws much attention during mark evaluations. However, as the lithography nodes advances and the 3D device stacks accumulate, overlay marks sub-segmentation and opaque hard-masks are widely exploit, both of which can be drawbacks for mark contrast in certain cases. As a result, the overlay mark contrast improvement techniques become a necessity, and attract more research interests. In this paper, we introduced a method to improve the mark contrast by using pixel improvement technique and theoretical reference correlation analysis. Such method can potentially be very effective when measuring overlay marks with extreme low contrast through thick opaque layers.

Conference Presentation

Citation Download Citation

Libin Zhang, Cong Lu, Yaobin Feng, and Yayi Wei "Method to improve the overlay image contrast and optimize the sub-segmentation mark", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161131 (22 February 2021); https://doi.org/10.1117/12.2583820

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