Magnetron deposition of MoS2 ultrathin films in conditions of magnetic field.

A. I. Belikov; A. I. Syomochkin; K. Z. Phyo; V. N. Kalinin

doi:10.1117/12.2624496

30 January 2022 Magnetron deposition of MoS₂ ultrathin films in conditions of magnetic field.

A. I. Belikov, A. I. Syomochkin, K. Z. Phyo, V. N. Kalinin

Proceedings Volume 12157, International Conference on Micro- and Nano-Electronics 2021; 121571F (2022) https://doi.org/10.1117/12.2624496
Event: International Conference on Micro- and Nano-Electronics 2021, 2021, Zvenigorod, Russian Federation

Abstract

Molybdenum disulfide (MoS₂) ultrathin films have been deposited onto Si substrates with different deposition parameters by DC-magnetron sputtering (DCMS) using of external magnetic field (MF) to contribute to the improvement of the promising device's characteristics for nano, optoelectronics, plasmonic, and spintronics. The film properties and morphology structure were compared in the case of the MF presence and its absence, varying the pole of the magnet, deposition time, the slope of the substrate holder, and the magnetic induction. The influence of MF on the MoS₂ thin films parameters such as grain size, surface roughness, bandgap energy, was studied by using atomic force microscopy (AFM) and spectrophotometry.

Citation Download Citation

A. I. Belikov, A. I. Syomochkin, K. Z. Phyo, and V. N. Kalinin "Magnetron deposition of MoS₂ ultrathin films in conditions of magnetic field.", Proc. SPIE 12157, International Conference on Micro- and Nano-Electronics 2021, 121571F (30 January 2022); https://doi.org/10.1117/12.2624496

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