International comparison of photomask linewidth standards: United States (NIST) and United Kingdom (NPL)

James E. Potzick; John W. Nunn

doi:10.1117/12.240148

21 May 1996 International comparison of photomask linewidth standards: United States (NIST) and United Kingdom (NPL)

James E. Potzick, John W. Nunn

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240148
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz photomasks with a variety of linewidth, spacewidth, and pitch patterns. The British and U.S. national laboratories have made comparative measurements of linewidth, spacewidth, and pitch on two national photomask linewidth standards in order to detect any systematic differences between their respective calibration systems. The measurement differences were all found to be within the calibration expanded uncertainties of both laboratories combined, and are not significant at the 95% confidence level.

Citation Download Citation

James E. Potzick and John W. Nunn "International comparison of photomask linewidth standards: United States (NIST) and United Kingdom (NPL)", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240148

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