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PROCEEDINGS VOLUME 4000
MICROLITHOGRAPHY 2000 | 27 FEBRUARY - 3 MARCH 2000
Optical Microlithography XIII
Editor(s): Christopher J. Progler
Editor Affiliations +
IN THIS VOLUME
11 Sessions, 165 Papers, 0 Presentations
Evaluating Lens Quality  (5)
RET Integration with Assist/OPC  (5)
Strong PSM Implementation  (5)
CD Control and Masks  (6)
Double Exposure and Filters  (5)
Image Quality and Overlay  (5)
Exploring the Limits  (5)
193-nm Integration  (6)
193/157 Issues  (4)
Exposure System Advances and Extensions  (6)
Poster Session  (113)
MICROLITHOGRAPHY 2000
27 February - 3 March 2000
Santa Clara, CA, United States
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Evaluating Lens Quality
Review of photoresist-based lens evaluation methods Paper
Joseph P. Kirk
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388926
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Impact of high-order aberrations on the performance of the aberration monitor Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389010
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In-situ measurement of lens aberrations Paper
Nigel R. Farrar, Adlai H. Smith, Daniel R. Busath, Dennis Taitano
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389021
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Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application Paper
Nakgeuon Seong, Gisung Yeo, Hanku Cho, Joo-Tae Moon
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389032
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Zernike coefficients: are they really enough? Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389042
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RET Integration with Assist/OPC
Effect of real masks on wafer patterning Paper
Chris A. Spence, Ramkumar Subramanian, David Teng, Ernesto Gallardo
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389052
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Lithographic comparison of assist feature design strategies Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389061
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Analytical description of antiscattering and scattering bar assist features Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389072
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OPC methodology and implementation to prototyping of small SRAM cells of 0.18-μm node logic gate levels Paper
Qizhi He, Mi-Chang Chang, Shane R. Palmer, Kayvan Sadra
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389083
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0.13-μm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks Paper
Yung-Tin Chen, Chia-Hui Lin, Hua Tai Lin, Hung-Chang Hsieh, Shinn Sheng Yu, Anthony Yen
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388927
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Strong PSM Implementation
Alt-PSM for 0.10-μm and 0.13-μm polypatterning Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388937
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Method of expanding process window for the double exposure technique with alt-PSMs Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388947
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Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388957
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Phase aware proximity correction for advanced masks Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388972
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CD Control and Masks
Optical lithography into the millennium: sensitivity to aberrations, vibration, and polarization Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388983
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Characterization of linewidth variation Paper
Alfred K. K. Wong, Antoinette F. Molless, Timothy A. Brunner, Eric Coker, Robert H. Fair, George L. Mack, Scott M. Mansfield
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388994
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KrF lithography for 130 nm Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389002
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Impact of optical enhancement techniques on the mask error enhancement function (MEEF) Paper
Marina V. Plat, Khanh B. Nguyen, Chris A. Spence, Christopher F. Lyons, Amada Wilkison
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389009
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Analytic approach to understanding the impact of mask errors on optical lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389011
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Modeling oblique incidence effects in photomasks Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389012
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Double Exposure and Filters
IDEAL double exposure method for polylevel structures Paper
Carmelo Romeo, Paolo Canestrari, Antonio Fiorino, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389013
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Spatial frequency filtering in the pellicle plane Paper
Bruce W. Smith, Hoyoung Kang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389014
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High-density lithography using attenuated phase-shift mask and negative resist Paper
Stanley Pau, Raymond A. Cirelli, Kevin J. Bolan, Allen G. Timko, John Frackoviak, Pat G. Watson, Lee E. Trimble, James W. Blatchford, Omkaram Nalamasu
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389015
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Customized illumination aperture filter for low k1 photolithography process Paper
Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai, Fu-Jye Liang, Chin Chiu Hsia
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389016
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Patterning 220-nm pitch DRAM patterns by using double mask exposure Paper
Dongseok Nam, Nakgeuon Seong, Hanku Cho, Joo-Tae Moon, Sangin Lee
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389017
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Image Quality and Overlay
Understanding lens aberration and influences to lithographic imaging Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389018
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Pattern asymmetry correction using assist patterns Paper
Manhyoung Ryoo, Dongseok Nam, Hanku Cho, Joo-Tae Moon, Sangin Lee
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389019
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Interaction of pattern orientation and lens quality on CD and overlay errors Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389020
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Practical optical-proximity-correction approach by considering interlayer overlap Paper
Byoung-Il Choi, Andrew Khoh
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389022
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Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners Paper
Thorsten Schedel, Alain B. Charles, Dietmar Ganz, Steffen R. Hornig, Guenther Hraschan, Wolfram Koestler, John G. Maltabes, Karl E. Mautz, Thomas Metzdorf, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389023
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Strong PSM Implementation
0.3-μm pitch random interconnect patterning with node connection phase-shifting mask: experiments and simulations Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389024
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Exploring the Limits
Extension of KrF lithography to sub-50-nm pattern formation Paper
Shuji Nakao, Jiroh Itoh, Akihiro Nakae, Itaru Kanai, Takayiki Saitoh, Hirosi Matsubara, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389025
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Phase-mask effects by dark-field lithography Paper
Donald L. White, Raymond A. Cirelli, Steven J. Spector, Myrtle I. Blakey, Obert R. Wood II
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389026
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Limits of optical lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389027
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Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication Paper
Michael Fritze, James M. Burns, Peter W. Wyatt, David K. Astolfi, T. Forte, Donna Yost, Paul Davis, Andrew V. Curtis, Douglas M. Preble, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389028
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193-nm Integration
Status of ArF lithography for the 130-nm technology node Paper
Kurt G. Ronse, Geert Vandenberghe, Patrick Jaenen, Christie Delvaux, Diziana Vangoidsenhoven, Frieda Van Roey, Ingrid Pollers, Mireille Maenhoudt, Anne-Marie Goethals, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389029
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Integration considerations for 130-nm device patterning using ArF lithography Paper
Uzodinma Okoroanyanwu, Harry J. Levinson, Chih-Yuh Yang, Suzette K. Pangrle, Jeff A. Schefske, Eric Kent
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389030
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Comparison study for sub-0.13-μm lithography between ArF and KrF lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389031
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Feasibility study of an embedded transparent phase-shifting mask in ArF lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389033
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Electrical critical dimension metrology for 100-nm linewidths and below Paper
Andrew Grenville, Brian Coombs, John M. Hutchinson, Kelin J. Kuhn, David Miller, Patrick M. Troccolo
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389034
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Issues and nonissues on a 193-nm step-and-scan system in production Paper
Jeff A. Schefske, Eric Kent, Uzodinma Okoroanyanwu, Harry J. Levinson, Charles R. Masud, Bob Streefkerk, Ralph M. Hanzen, Joerg Brueback
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389035
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193/157 Issues
Experimentation and modeling of organic photocontamination on lithographic optics Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389036
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Long-term testing of optical components for 157-nm lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389037
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Behavior of fused silica materials for microlithography irradiated at 193 nm with low-fluence ArF radiation for tens of billions of pulses Paper
Richard G. Morton, Richard L. Sandstrom, Gerry M. Blumenstock, Zsolt Bor, Chris K. Van Peski
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389038
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Prospects for long-pulse operation of ArF lasers for 193-nm microlithography Paper
Thomas Hofmann, Bruce Johanson, Palash P. Das
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389039
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Exposure System Advances and Extensions
Overlay performance in advanced processes Paper
Frank Bornebroek, Jaap Burghoorn, James S. Greeneich, Henry J. L. Megens, Danu Satriasaputra, Geert Simons, Sunny Stalnaker, Bert Koek
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389040
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193-nm step-and-scan lithography equipment Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389041
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Advances in 193-nm lithography tools Paper
Daniel R. Cote, David Ahouse, Daniel N. Galburt, Hilary G. Harrold, Justin Kreuzer, Mike Nelson, Mark L. Oskotsky, Geoffrey O'Connor, Harry Sewell, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389043
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Aberration averaging using point spread function for scanning projection systems Paper
Hiroshi Ooki, Tomoya Noda, Koichi Matsumoto
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389044
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Realization of very small aberration projection lenses Paper
Toshiyuki Yoshihara, Ryo Koizumi, Kazuhiro Takahashi, Shigeyuki Suda, Akiyoshi Suzuki
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389045
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Exploring the Limits
Advanced technology for extending optical lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389046
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Poster Session
Understanding the impact of full-field mask error factor Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389047
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Impact of MEEF on low k1 lithography and mask inspection Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389048
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Mask error factor impact on the 130-nm node Paper
John N. Randall, Christopher C. Baum, Keeho Kim, Mark E. Mason
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389049
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Characterization of spatial CD variability, spatial mask-level correction, and improvement of circuit performance Paper
Michael Orshansky, Linda Milor, Michael Brodsky, Ly Nguyen, Gene Hill, Yeng-Kaung Peng, Chenming Hu
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389050
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Validation of repair process for DUV attenuated phase-shift mask Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389051
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Predictive and corrective model for bulk heating distortion in photomasks Paper
Bassam Shamoun, David Trost, Frank Chilese
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389053
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Pulsed UV laser Raman and fluorescence spectroscopy of large-area fused silica photomask substrates Paper
Christian Muehlig, Sylvia Bark-Zollmann, Dieter Grebner, Wolfgang Triebel
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389054
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Scalable pattern generator data path: for the future Paper
Charlotta Johansson, Lars Ivansen, Anders Thuren, Per Liden, Mans Bjuggren
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389055
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New pattern generation system based on i-line stepper: photomask repeater Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389056
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Modeling the effects of excimer laser bandwidths on lithographic performance Paper
Armen Kroyan, Joseph J. Bendik, Olivier Semprez, Nigel R. Farrar, Christopher G. Rowan, Chris A. Mack
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389057
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Exposure latitude analysis for dense line and space patterns by using diffused aerial image model Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389058
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Direction-oriented partition of unity finite element method for lithography simulation of the image formation problem in photoresist Paper
Yao-Chang Chang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389059
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Rigorous diffraction analysis for future mask technology Paper
Andreas Erdmann, Christoph M. Friedrich
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389060
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Mask topography effects in low k1 lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389062
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157-nm lithography simulation using a finite-difference time-domain method with oblique incidence in a multilayered medium Paper
Michael S. Yeung, Eytan Barouch, Clifford A. Martin, James A. McClay
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389063
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Analysis of OPC features in binary masks at 193 nm Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389064
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Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks Paper
Seung-Gol Lee, Hyun-Jun Kim, Dong-Hoon Lee, Jong-Ung Lee
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389065
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Deducing aerial image behavior from AIMS data Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389066
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Factors affecting pitch bias in lithography simulation Paper
Stewart A. Robertson, Edward K. Pavelchek, Catherine I. Swible-Keane, John F. Bohland, Michael T. Reilly
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389067
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New λ/NA scaling equations for resolution and depth-of-focus Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389068
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Theoretical model describing laser microhole drilling processes for organic polymers Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389069
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Dynamic performance of DUV step-and-scan systems and process latitude Paper
Michel Klaassen, Marian Reuhman, Antoine Loock, Mike Rademaker, Jack Gemen
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389070
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Linewidth uniformity error analysis for step-and-scan systems Paper
John D. Zimmerman, Javed Sumra, Y.K. Arif Leong, Pradeep K. Govil, Greg H. Baxter
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389071
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Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners Paper
Ivan Lalovic, Joseph T. Parry, Brett Gwynn, Christopher D. Silsby
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389073
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Impact of illumination pupil-fill spatial variation on simulated imaging performance Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389074
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Improving image control by correcting the lens-heating focus drift Paper
Bwo-Jung Cheng, Hsiang-Chung Liu, Yuanting Cui, Jiyou Guo
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389075
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Characterization of leveling modes on i-line stepper Paper
Amir Wachs, David Cohen, Ayelet Margalit-Ilovich
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389076
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Self-sustaining dose control system: ways to improve the exposure process Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389077
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Simulation-based proximity correction in high-volume DRAM production Paper
Werner Fischer, Ines Anke, Giorgio Schweeger, Joerg Thiele
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389078
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Advanced mix-and-match using a high-NA i-line scanner Paper
Jan Pieter Kuijten, Thomas A. Harris, Ludo van der Heijden, David Witko, John Cossins, James Foster, Douglas R. Ritchie
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389079
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Effect of nonlinear errors on 300-mm wafer overlay performance Paper
Sebastian Schmidt, Alain B. Charles, Dietmar Ganz, Steffen R. Hornig, Guenther Hraschan, John G. Maltabes, Karl E. Mautz, Thomas Metzdorf, Ralf Otto, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389080
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Continuous Image Writer: a new approach to fast direct writing Paper
Joerg Paufler, Stefan Brunn, Joachim Bolle, Tim Koerner, Aenne Baudach, Reiner Lindner
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389081
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Optical holography used in optical microlithography Paper
Boru Feng, Jin Zhang, Desheng Hou, Fen Chen
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389082
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Across field and across wafer flare: from KrF stepper to ArF scanner Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389084
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Determining and reducing the overhead losses in an ASIC-type environment Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389085
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Improvement of CD control and resolution by optimizing inorganic ARC process Paper
Atsumi Yamaguchi, Atsushi Ueno, Kouichirou Tsujita
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389086
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Novel polymeric antireflective coating (PARC) for better uniformity control of critical dimension Paper
Kung Linliu, Mai-Rue Kuo, Yi-Ren Huang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389087
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130-nm KrF lithography for DRAM production with 0.68-NA scanner Paper
Eiichi Kawamura, Kouichi Nagai, Hideyuki Kanemitsu, Yasuko Tabata, Soichi Inoue
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389088
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Strategy for optimizing random code lithography patterning in 0.18-μm generation mask ROM Paper
Chih-Ping Chen, Shun-Li Lin, Ta-Hung Yang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389089
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Adjustment of bilayer optical properties and the effect on imaging and etching performance Paper
Mark O. Neisser, John J. Biafore, Patrick Foster, Gregory D. Spaziano, Thomas R. Sarubbi, Veerle Van Driessche, Grozdan Grozev, Plamen Tzviatkov
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389090
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Image shortening and process development in BEOL lithography Paper
Ronald DellaGuardia, Dennis J. Warner, Zheng Chen, Martin Stetter, Richard A. Ferguson, Anne E. McGuire, Karen D. Badger
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388928
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Precise control of critical dimension shrinkage and enlargement by in-situ polysilicon etch Paper
Kung Linliu, Mai-Rue Kuo
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388929
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Structure end foreshortening: lithography-driven design limitations Paper
Uwe Paul Schroeder, Dennis J. Warner
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388930
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Novel dual-layer polymeric antireflective coating (PARC) for sub-0.18-μm KrF lithography Paper
Kung Linliu, Yi-Ren Huang, Mai-Rue Kuo
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388931
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Lithography process cost considerations for 120-nm groundrules Paper
Bernhard Liegl, Christian Summerer
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388932
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OPC for logic and embedded applications: the reverse approach Paper
Uwe Paul Schroeder, Tobias Mono
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388933
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Automatic parallel optical proximity correction and verification system Paper
Takahiro Watanabe, Eiji Tsujimoto, Kyoji Nakajo, Keiji Maeda
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388934
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Overlay budget considerations for an all-scanner fab Paper
Rolf Seltmann, Wolfgang Demmerle, Marc Staples, Anna Maria Minvielle, Bernd Schulz, Sven Muehle
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388935
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Accuracy of diffused aerial image model for full-chip-level optical proximity correction Paper
Jee-Suk Hong, Hee-Bom Kim, Hyoung-Soon Yune, Chang-Nam Ahn, Young-Mo Koo, Ki-Ho Baik
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388936
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Variable-threshold optical proximity correction (OPC) models for high-performance 0.18-μm process Paper
Hongmei Liao, Shane R. Palmer, Kayvan Sadra
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388938
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Optical proximity correction considering mask manufacturability and its application to 0.25-μm DRAM for enhanced device performance Paper
Chul-Hong Park, Sang-Uhk Rhie, Ji-Hyeon Choi, Ji-Soong Park, Hyeong-Weon Seo, Yoo-Hyon Kim, Young-Kwan Park, Woo-Sung Han, Won-Seong Lee, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388939
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Modified proximity function for OPC in laser direct writing Paper
Jinglei Du, Fuhua Gao, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388940
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Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography Paper
Young-Mog Ham, Seok-Kyun Kim, Sang-Jin Kim, Cheol Hur, YoungSik Kim, Ki-Ho Baik, Bong-Ho Kim, Dong-Jun Ahn
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388941
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OPC beyond 0.18 μm: OPC on PSM gates Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388942
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Double exposure technique to reduce line shortening and improve pattern fidelity Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388943
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Fabrication of small contact using practical pupil filtering Paper
Hoyoung Kang, Bruce W. Smith
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388944
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Improved process latitude photolithography 0.18-μm technology using multiple focal planes Paper
Anne-Sophie Callec, Jean-Paul E. Chollet
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388945
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Depth-of-focus enhancement of isolated lines by multiple-focus exposure with negative-tone resist process Paper
Masashi Fujimoto, Tamio Yamazaki, Takeo Hashimoto
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388946
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Fabrication of isolated gates by negative-tone process and resolution enhancement technology Paper
Ryoko Morikawa, Noboru Uchida, Minoru Watanabe, Sachiko Yabe, Satoshi Machida, Takashi Taguchi
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388948
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0.32-μm pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelength Paper
Shuji Nakao, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388949
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Low k1 process optimization for i-line lithography Paper
Jeong Won Kim, Hoon Huh, Sang-Bum Han
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388950
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Forbidden pitches for 130-nm lithography and below Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388951
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Simulation-based method for sidelobe supression Paper
Christoph Dolainsky, Paul Karakatsanis, Fritz Gans, Rainer Pforr, Joerg Thiele
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388952
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High-transmission attenuated PSM: benefits and limitations through a validation study of 33%, 20%, and 6% transmission masks Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388953
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Simpler attenuated phase-shifting mask Paper
Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, Ping Su
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388954
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Application of attenuated phase-shift masks to sub-0.18-μm logic patterns Paper
Michael Fritze, Peter W. Wyatt, David K. Astolfi, Paul Davis, Andrew V. Curtis, Douglas M. Preble, Susan G. Cann, Sandy Denault, David Y. Chan, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388955
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Integration of attenuated phase-shift mask to 0.13-μm technology contact level masking process Paper
Lay Cheng Choo, O'Seo Park, Michael J. Sack, Siu Chung Tam
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388956
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Practical software design and experimental research of attenuated phase-shifting masks Paper
Chongxi Zhou, Boru Feng, Desheng Hou, Jin Zhang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388958
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Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks Paper
Michael T. Reilly, Colin R. Parker, Karen Kvam, Robert John Socha, Mircea V. Dusa
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388959
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Gauging the performance of an in-situ interferometer Paper
Mark Terry, Adlai H. Smith, Ken Rebitz
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388960
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Sensitivity of coma monitors to resist processes Paper
Christian Summerer, Zhijian G. Lu
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388961
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Aberrations of steppers using phase-shifting point diffraction interferometry Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388962
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Degree of patterning performance (DOPP) at low K lithography Paper
Donggyu Yim, Seung-Hyuk Lee, Myung-Goon Gil, Young-Mog Ham, Bong-Ho Kim, Ki-Ho Baik
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388963
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Lens aberration measurement technique using attentuated phase-shifting mask Paper
Akira Imai, Katsuya Hayano, Hiroshi Fukuda, Naoko Asai, Norio Hasegawa
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388964
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Impact of lens aberration on pattern symmetry of DRAM cells Paper
Katsuyoshi Kobayashi, Teruyoshi Yao, Yuichiro Yanagishita, Isamu Hanyu
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388965
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Effect of lens aberrations on pattern placement error Paper
Richard D. Holscher, Pary Baluswamy
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388966
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Basic imaging characteristics of phase-edge lithography and impact of lens aberration on these characteristics Paper
Shuji Nakao, Itaru Kanai, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388967
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Influence of resist process on the best focus shift due to lens spherical aberration Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388968
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Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling Paper
Christoph M. Friedrich, Leonhard Mader, Andreas Erdmann, Steffen List, Ronald L. Gordon, Christian K. Kalus, Uwe A. Griesinger, Rainer Pforr, Josef Mathuni, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388969
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Understanding the parameters for strong phase-shift mask lithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388970
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Manufacturability of 248-nm phase-shift lithography for 100-nm transistors Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388971
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Precise CD control of 140-nm gate patterns using phase-edge PSM Paper
Shoji Hotta, Osamu Inoue, Hiroshi Fukuda, Norio Hasegawa
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388973
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Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning Paper
Kuei-Chun Hung, Benjamin Szu-Min Lin, Hsien-an Chang, Alex Tseng, Lien-Sheng Chung, WeiJyh Liu, Der-Yuan Wu, Peter Huang
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388974
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Al2O3 coatings for 193 nm: a nonlinearly absorbing material Paper
Oliver Apel, Klaus R. Mann
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388975
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High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography Paper
Uwe Stamm, Rainer Paetzel, Igor Bragin, Juergen Kleinschmidt, Peter Lokai, Rustem Osmanov, Thomas Schroeder, Martin Sprenger, Wolfgang Zschocke
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388976
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High-repetition-rate ArF excimer laser for 193-nm lithography Paper
Kouji Kakizaki, Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Akifumi Tada, Shinji Kasahara, Tatsushi Igarashi, Kazuaki Hotta
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388977
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Laser spectrum line shape metrology at 193 nm Paper
Alexander I. Ershov, Gunasiri G. Padmabandu, Jeremy D. Tyler, Palash P. Das
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388978
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Performance of very high repetition rate ArF lasers Paper
Jean-Marc Hueber, Herve Besaucele, Palash P. Das, Rick Eis, Alexander I. Ershov, Vladimir B. Fleurov, Dmitri Gaidarenko, Thomas Hofmann, Paul C. Melcher, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388979
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Output stabilization technology with chemical impurity control on ArF excimer laser Paper
Akira Sumitani, Satoshi Andou, Takehito Watanabe, Masayuki Konishi, Suguru Egawa, Ikuo Uchino, Takeshi Ohta, Katsutomo Terashima, Natsushi Suzuki, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388980
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Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography Paper
Tatsuo Enami, Osamu Wakabayashi, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388981
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High-resolution multigrating spectrometer for high-quality deep-UV light source production Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388982
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Extending the performance of KrF laser for microlithography by using novel F2 control technology Paper
Paolo Zambon, Mengxiong Gong, Jason Carlesi, Gunasiri G. Padmabandu, Mike Binder, Ken Swanson, Palash P. Das
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388984
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Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography Paper
Rainer Paetzel, Hans Stephen Albrecht, Vadim Berger, Igor Bragin, Matthias Kramer, Juergen Kleinschmidt, Marcus Serwazi
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388985
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Comparison of ArF and KrF laser performance at 2 kHz for microlithography Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388986
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High-NA high-throughput scanner compatible 2-kHz KrF excimer laser for DUV lithography Paper
Hiroaki Nakarai, Naoto Hisanaga, Natsushi Suzuki, Takeshi Matsunaga, Takeshi Asayama, Jun Akita, Toru Igarashi, Tatsuya Ariga, Satoru Bushida, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388987
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Fluoropolymers for 157-nm lithography: optical properties from VUV absorbance and ellipsometry measurements Paper
Roger H. French, Robert C. Wheland, David J. Jones, James N. Hilfiker, Ron A. Synowicki, Fredrick C. Zumsteg Jr., Jerald Feldman, Andrew E. Feiring
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388988
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Absolute index of refraction and its temperature dependence of calcium fluoride, barium fluoride, and strontium fluoride near 157 nm Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388989
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New silica glass (AQF) for 157-nm lithography Paper
Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, Shuhei Yoshizawa
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388990
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Advanced F2 lasers for microlithography Paper
Klaus Vogler, Uwe Stamm, Igor Bragin, Frank Voss, Sergei V. Govorkov, Gongxue Hua, Juergen Kleinschmidt, Rainer Paetzel
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388991
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Feasibility of highly line-narrowed F2 laser for 157-nm microlithography Paper
Alexander I. Ershov, Thomas P. Duffey, Eckehard D. Onkels, William N. Partlo, Richard L. Sandstrom
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388992
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Laser cleaning of optical elements in 157-nm lithography Paper
Theodore M. Bloomstein, Mordechai Rothschild, Vladimir Liberman, D. E. Hardy, N. N. Efremow Jr., Stephen T. Palmacci
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388993
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Properties and potential of VUV lithographic thin film materials Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388995
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VUV transmittance of fused silica glass influenced by thermal disorder Paper
Noriaki Shimodaira, Kazuya Saito, Akira J. Ikushima, Toru Kamihori, Shuhei Yoshizawa
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388996
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High-repetition-rate fluorine laser for microlithography Paper
Junichi Fujimoto, Shinji Nagai, Koji Shio, Yasuaki Iwata, Kiwamu Takehisa, Toshihiro Nishisaka, Osamu Wakabayashi, Hakaru Mizoguchi
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388997
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Exposure System Advances and Extensions
Development of 157-nm small-field and mid-field microsteppers Paper
Ron E. Miller, Paul M. Bischoff, Roger C. Sumner, Stephen W. Bowler, Warren W. Flack, Galen Fong
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388998
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Poster Session
Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study Paper
Kent H. Nakagawa, Uwe Hollerbach, J. Fung Chen
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.388999
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Half-lambda imaging with KrF: performance challenges and trade-offs as expected through simulation Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389000
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Integrated phase-shifting software solution for IC design to manufacturing Paper
Hua-Yu Liu, Clive Wu, Xiaoyang Li
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389001
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Prospects for very high repetition rate lasers for microlithography Paper
Igor Bragin, Vadim Berger, Rainer Paetzel, Uwe Stamm, Andreas Targsdorf, Juergen Kleinschmidt, Dirk Basting
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389003
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Dynamic change of transmission of CaF2 single crystals by irradiating with ArF excimer laser light Paper
Jochen Alkemper, Joerg Kandler, Lorenz Strenge, Ewald Moersen, Christian Muehlig, Wolfgang Triebel
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389004
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Progress in 157-nm lithography development at Intel: resists and reticles Paper
Veena Rao, Eric M. Panning, Ling Liao, John M. Hutchinson, Andrew Grenville, Susan M. Holl, Don Bruner, Raghu Balasubramanian, Ronald Kuse, et al.
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389005
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SVG 157-nm lithography approach Paper
James A. McClay, Michael A. DeMarco, Thomas J. Fahey, Matthew E. Hansen, Bruce A. Tirri
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389006
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Interference lithography at 157 nm Paper
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389007
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Influence of film stress on advanced optical reticle distortions Paper
Lowell K. Siewert, Andrew R. Mikkelson, Roxann L. Engelstad, Edward G. Lovell, Mark E. Mason, R. Scott Mackay
Proceedings Volume Optical Microlithography XIII, (2000) https://doi.org/10.1117/12.389008
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