Impact of Zernike cross-term on linewidth control

Toshiharu Nakashima; Kenji Higashi; Shigeru Hirukawa

doi:10.1117/12.474590

30 July 2002 Impact of Zernike cross-term on linewidth control

Toshiharu Nakashima, Kenji Higashi, Shigeru Hirukawa

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474590
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Recent introduction of phase measurement interferometer (PMI), to measure wavefront aberrations brought about rapid reduction of residual aberrations in stepper and scanner projection lenses. Zernike sensitivity method (ZSM) is useful to capture and to understand the lens aberrations impact on the imaging performances, and to guide the improvements in patterning performance of the projection tools. In this paper we present ZSM for CD-Focus curve capable of precisely predicting CD at any focus position. We found that cross-term interactions of several Zernike combinations impact ZSM for CD-Focus. We present an example of V-H difference for which the cross-term interactions dominate. Aerial image simulation results presented here are illustrated by corresponding to experimental results.

Citation Download Citation

Toshiharu Nakashima, Kenji Higashi, and Shigeru Hirukawa "Impact of Zernike cross-term on linewidth control", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474590

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