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Elliptical mirrors for X-ray microfocusing were manufactured using the new fabrication methods of elastic emission machining (EEM) and plasma chemical vaporization machining (CVM). Surface profiles measured with stitching interferometry showed a maximum deviation around the ideal figure of about 5nm in peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculation, taking the measured surface profile into consideration, well reproduced the measured focusing properties both at the beam waist and around the beam waist. In addition, two-dimensional focusing unit using K-B mirror arrangement was also developed and evaluated to have about 200 × 200 nm2 focusing performance.
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