Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov; Yongfa Fan; Frank Charles Cropanese; Neal Vincent Lafferty; Lena V. Zavyalova; Hoyoung Kang; Bruce W. Smith

doi:10.1117/12.537350

28 May 2004 Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov, Yongfa Fan, Frank Charles Cropanese, Neal Vincent Lafferty, Lena V. Zavyalova, Hoyoung Kang, Bruce W. Smith

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.537350
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A Talbot interference immersion lithography system that uses a compact prism is presented. The use of a compact prism allows the formation of a fluid layer between the optics and the image plane, enhancing the resolution. The reduced dimensions of the system alleviate coherence requirements placed on the source, allowing the use of a compact ArF excimer laser. Photoresist patterns with a half pitch of 45 nm were formed at an effective NA of 1.05. In addition, a variable NA immersion interference system was used to achieve an effective NA of 1.25. The smallest half-pitch of the photoresist pattern produced with this system was 38 nm.

Citation Download Citation

Anatoly Bourov, Yongfa Fan, Frank Charles Cropanese, Neal Vincent Lafferty, Lena V. Zavyalova, Hoyoung Kang, and Bruce W. Smith "Immersion microlithography at 193 nm with a Talbot prism interferometer", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.537350

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