NGL data conversion system

Masahiro Shoji; Nobuyasu Horiuchi

doi:10.1117/12.598389

6 May 2005 NGL data conversion system

Masahiro Shoji, Nobuyasu Horiuchi

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598389
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We are developing a NGL data conversion system for EPL, for LEEPL, and for EBDW, which is based on our established photomask data conversion system, PATACON PC-cluster. For EPL data conversion, it has SF division, Complementary division, Stitching, Proximity effect correction, Alignment mark insertion, EB stepper control data creation, and Mask inspection data creation. For LEEPL data conversion, it has Pattern checking, Complementary division, Stitching, Stress distortion correction, Alignment mark insertion, and Mask inspection data creation. For EB direct-writing data conversion, it has Proximity effect correction and Extraction of aperture pattern for cell projection exposure.

Citation Download Citation

Masahiro Shoji and Nobuyasu Horiuchi "NGL data conversion system", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598389

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