Multiscale structures for polarization control by using imprint and UV lithography

Xuegong Deng; Jian Wang; Feng Liu; Paul F. Sciortino Jr.; Xiaoming Liu; Alan Graham

doi:10.1117/12.630578

16 November 2005 Multiscale structures for polarization control by using imprint and UV lithography

Xuegong Deng, Jian Wang, Feng Liu, Paul F. Sciortino Jr., Xiaoming Liu, Alan Graham

Proceedings Volume 6003, Nanostructure Integration Techniques for Manufacturable Devices, Circuits, and Systems: Interfaces, Interconnects, and Nanosystems; 60030X (2005) https://doi.org/10.1117/12.630578
Event: Optics East 2005, 2005, Boston, MA, United States

Abstract

We investigate a viable manufacture method of large area transmission only polarizers (TOPOL). A multilayer, mixed-scale (nanostructures and microstructrures) design is presented to accomplish the required functional integration. The effective domain of the device is less than 2 μm in thickness. Nanoimprint and UV lithography is combined to demonstrate the viable fabrication processes with 100 mm diameter wafers. The proposed structures can be further integrated. We also present detailed comparisons of the integrated devices with high-performance commercial-grade bulk optics.

Citation Download Citation

Xuegong Deng, Jian Wang, Feng Liu, Paul F. Sciortino Jr., Xiaoming Liu, and Alan Graham "Multiscale structures for polarization control by using imprint and UV lithography", Proc. SPIE 6003, Nanostructure Integration Techniques for Manufacturable Devices, Circuits, and Systems: Interfaces, Interconnects, and Nanosystems, 60030X (16 November 2005); https://doi.org/10.1117/12.630578

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