Molecular glass resists for next generation lithography

Anuja De Silva; Nelson Felix; Jing Sha; Jin-Kyun Lee; Christopher K. Ober

doi:10.1117/12.772644

15 April 2008 Molecular glass resists for next generation lithography

Anuja De Silva, Nelson Felix, Jing Sha, Jin-Kyun Lee, Christopher K. Ober

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231L (2008) https://doi.org/10.1117/12.772644
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The idea of using small molecules instead of polymers for next generation lithography may enable improved resolution and line edge roughness (LER). Rather than using polymeric materials we are focusing on a new class of materials known as molecular glasses (MGs). These are low molecular weight organic materials that demonstrate high glass transition temperatures despite their modest size. Unlike polymeric resists, these molecules have the added advantages of distinct size and uniformity. We have synthesized a series of molecular resists containing rigid aromatic backbones and phenolic moieties suited for electron beam and Extreme Ultraviolet (EUV) lithography as both positive tone and negative tone photoresists. An increase in glass transition temperature is observed with increasing size and rigidity. Glass transition temperatures (Tgs) between 80-130°C have been observed for t- BOC protected positive tone resists with molecular weights within the range of 800-1200g/mol. MGs with branched, dense structures are explored to design high Tg resist systems with improved sensitivity and contrast. The effects of protection ratio, high and low activation protecting groups, post exposure bake conditions, etch resistance and outgassing have been tested using selected phenolic MG resists. These new resist architectures are synthesized and evaluated to attain sub 30nm feature sizes required of candidates for next generation lithography.

Citation Download Citation

Anuja De Silva, Nelson Felix, Jing Sha, Jin-Kyun Lee, and Christopher K. Ober "Molecular glass resists for next generation lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231L (15 April 2008); https://doi.org/10.1117/12.772644

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