Study of haze in 193nm high dose irradiated CaF2 crystals

Ute Natura; Stephan Rix; Martin Letz; Lutz Parthier

doi:10.1117/12.836409

31 December 2009 Study of haze in 193nm high dose irradiated CaF₂ crystals

Ute Natura, Stephan Rix, Martin Letz, Lutz Parthier

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 75041P (2009) https://doi.org/10.1117/12.836409
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

Crystalline calcium fluoride is one of the key materials for 193 nm lithography and is used for laser optics, beam delivery system optics and stepper/scanner optics. Laser damage occurs, when light is absorbed, creating defects in the crystal. Haze is known as a characteristic optical defect after high dose irradiation of CaF₂ - an agglomeration of small scattering and absorbing centers. In order to prevent unnecessary damage of optical components, it is necessary to understand the mechanism of laser damage, the origin of haze and the factors that serve to prevent it. Stabilized M centers were described as reversible absorbing defects in CaF₂, which can be annealed by lamp or laser irradiation. In this study the irreversible defects created by 193 nm laser irradiation were investigated.

Citation Download Citation

Ute Natura, Stephan Rix, Martin Letz, and Lutz Parthier "Study of haze in 193nm high dose irradiated CaF₂ crystals", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75041P (31 December 2009); https://doi.org/10.1117/12.836409

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