Paper
30 March 2010 Simplified "Litho-Cluster-Only" solution for double patterning
H. Tanaka, K. Hoshiko, T. Shimokawa, H. F. Hoefnagels, D. E. Keller, S. Wang, O. Tanriseven, R. Maas, J. Mallman, K. Shigemori, C. Rosslee
Author Affiliations +
Abstract
Double patterning is one of the enabling techniques to allow for further shrinking of devices in the future. Many different solutions, like LELE (Litho-Etch-Litho-Etch) and LPL (Litho-Process-Litho), have been investigated in the past years. In this paper a simplified - "Litho-Cluster-Only" - solution for double patterning is presented. This topcoat-less thermal freeze process has high capability of reaching 26 nm 1:1 LS. In addition it is shown that defect counts for the thermal freeze process approach defect numbers for high end immersion processes.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Tanaka, K. Hoshiko, T. Shimokawa, H. F. Hoefnagels, D. E. Keller, S. Wang, O. Tanriseven, R. Maas, J. Mallman, K. Shigemori, and C. Rosslee "Simplified "Litho-Cluster-Only" solution for double patterning", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391V (30 March 2010); https://doi.org/10.1117/12.848462
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Double patterning technology

Semiconducting wafers

Optical alignment

Scanning electron microscopy

Lithography

Reticles

Sensors

RELATED CONTENT

Toward Submicron A New Phase Of Optical Stepper
Proceedings of SPIE (June 30 1986)
Preliminary Testing Results For A New X-Ray Stepper
Proceedings of SPIE (August 01 1989)
Evaluation of the dual-exposure technique
Proceedings of SPIE (August 22 2001)
Spacer process and alignment assessment for SADP process
Proceedings of SPIE (March 13 2012)
A Submicron Lithography Process Using Philips I-Line Stepper
Proceedings of SPIE (January 01 1988)
Achieving overlay budgets for double patterning
Proceedings of SPIE (March 16 2009)

Back to Top