Development of a standalone zoneplate based EUV mask defect review tool

Chami Perera

doi:10.1117/12.2656116

15 September 2022 Development of a standalone zoneplate based EUV mask defect review tool

Chami Perera

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC1232503 (2022) https://doi.org/10.1117/12.2656116
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Chami Perera "Development of a standalone zoneplate based EUV mask defect review tool", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232503 (15 September 2022); https://doi.org/10.1117/12.2656116

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