Laser mask writer addressable to 90nm nodes with sustainability considered

Martin Glimtoft

doi:10.1117/12.2656154

15 September 2022 Laser mask writer addressable to 90nm nodes with sustainability considered

Martin Glimtoft

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250L (2022) https://doi.org/10.1117/12.2656154
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Martin Glimtoft "Laser mask writer addressable to 90nm nodes with sustainability considered", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250L (15 September 2022); https://doi.org/10.1117/12.2656154

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available