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Gaku Tsuchibuchi
at Taiyo Nippon Sanso Corp
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 23 March 2020 Presentation + Paper
Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O3
Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman
Proceedings Volume 11326, 113260S (2020) https://doi.org/10.1117/12.2551699
KEYWORDS: Atomic layer deposition, Etching, Optical lithography, Aluminum, Ozone, Resistance, Wet etching, Titanium dioxide, Metals
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