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Wenjie Lu
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Publications (1)
Proceedings Article | 17 March 2012 Paper
The effects of plasma exposure on low-k dielectric materials
J. Shohet, H. Ren, M. Nichols, H. Sinha, W. Lu, K. Mavrakakis, Q. Lin, N. Russell, M. Tomoyasu, G. Antonelli, S. Engelmann, N. Fuller, V. Ryan, Y. Nishi
Proceedings Volume 8328, 83280I (2012) https://doi.org/10.1117/12.917967
KEYWORDS: Plasma, Dielectrics, Ions, Vacuum ultraviolet, Ultraviolet radiation, Synchrotrons, Silicon, Nitrogen, Oxygen, Plasma systems
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