Using binary etch and sub-wavelength DUV photolithography, we have designed and fabricated a variety of flat optical devices (lenses, vortex phase plates, vortex plus lens, and diffusers) useful in telecommunications and other areas. The devices provide the precision and low cost associated with modern semi-conductor manufacturing and offer unique functional performance. Since the design method involves selective binary removal of substrate material we designate derivative devices partial etch phase (PEP) devices. Design principles and fabricated device performance are described.
T. W. Mossberg, J. M. Hannigan, and D. Iazikov, "Partial etch phase (PEP) optical elements for high-volume applications," Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011504 (Presented at SPIE OPTO: January 29, 2017; Published: 20 February 2017); https://doi.org/10.1117/12.2250038.
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