Structural colours represents a research area of great interest, due to a wide field of application ranging from micro-security to biomimetic materials. At present metallic substrate are heavily employed and only a partial spectra of colours can be realised. We propose a novel, metal-free technology that exploits the complex scattering from a disordered three-dimensional dielectric material on a silicon substrate. We reproduce experimentally the full spectrum of CMYK colours, including variations in intensity. Our resolution lies in the nm range, limited only by the electron beam lithography fabrication process. We demonstrate that this technique is extremely robust, suitable for flexible and reusable substrates. Full of these notable proprieties these nano-structures fits perfectly with the requirements of a real-world technology.
Marcella Bonifazi, Valerio Mazzone, and Andrea Fratalocchi, "Metal free structural colours via disordered nanostructures with nm resolution and full CYMK colour spectrum," Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 101150E (Presented at SPIE OPTO: January 30, 2017; Published: 28 April 2017); https://doi.org/10.1117/12.2251936.
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Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon