We report the mass production of blue LEDs on dry-etched patterned sapphire substrates using the AIX R6 tool in a 31×4" configuration. The system was operated in a continuous run mode, i.e. cleaning the showerhead after a series of LED runs. Production stability was characterized by monitoring of wavelength, light output power (LOP), and electrostatic discharge (ESD) yields. We developed a dynamic multi-zone Topside Temperature Control and the TEQualizer function. The TEQualizer function is based on a 400nm pyrometry open loop wafer surface temperature control, using Inside P400 by Laytec. Combining this wafer-to-wafer and run -to-run temperature stability improvement with an optimized wafer carrier, we demonstrated an on-wafer uniformity of stdv of 1.1nm, a wafer-to-wafer uniformity of stdv 1.1nm and a run-to-run reproducibility of stdv <1nm, resulting in a total wafer area wavelength yield of >90% in a 6 nm bin. LOP stability was demonstrated within a 3% window with no visible run-to-run trend. An absolute buffer layer growth temperature window was defined through a Design of Experiment on buffer layers targeting best ESD yield - in particular looking into defect related morphology and its correlation with Inside P400 readings. We have demonstrated an ESD yield >90% in continuous run mode to be used in the mass production of InGaN based blue LEDs.
A. R. Boyd, H. Behmenburg, O. Feron, Clifford McAleese, J. O'Dowd, Arthur Beckers, and Michael Heuken, "Blue LED mass production in a close-coupled showerhead MOCVD tool (Conference Presentation)," Proc. SPIE 10124, Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XXI, 101240G (Presented at SPIE OPTO: January 31, 2017; Published: 20 April 2017); https://doi.org/10.1117/12.2249271.5398643878001.
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