In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architecture that facilitated the increase of EUV power from 100W to >200W, and the technical challenges for power scaling of key source parameters and subsystems. Finally, we will describe current power-scaling research activities and provide a forward looking perspective for LPP EUV sources towards 500W.
Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Yezheng Tao, Michael Purvis, Slava I. Rokitski, Georgiy O. Vaschenko, Robert J. Rafac, and David C. Brandt, "Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)," Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101431I (Presented at SPIE Advanced Lithography: March 02, 2017; Published: 5 May 2017); https://doi.org/10.1117/12.2258628.5402270309001.
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