Directed Self Assembly (DSA) has emerged as one of the most compelling next generation patterning techniques for sub-7nm via or contact layers. A key issue in enabling DSA as a mainstream patterning technique is the generation of grapho-epitaxy based guiding pattern (GP) shapes to assemble the contact patterns on target with high fidelity and resolution. Current GP generation is mostly empirical, and limited to a very small number of via configurations. In this paper, we propose the first model-based GP synthesis algorithm and methodology for on-target and robust DSA, on general via pattern configurations. The final post-RET printed GPs derived from our original synthesized GPs are resilient to process variations and continue to maintain the same DSA fidelity in terms of placement error and target shape.
Joydeep Mitra, Andres Torres, and David Z. Pan, "Process, design rule, and layout co-optimization for DSA based patterning of sub-10nm Finfet devices," Proc. SPIE 10144, Emerging Patterning Technologies, 101440G (Presented at SPIE Advanced Lithography: February 28, 2017; Published: 21 March 2017); https://doi.org/10.1117/12.2257313.
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