Grapho-epitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. In this work, a dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the pre-pattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer-surface interactions in directed self-assembly flows.
Jan Doise, Boon Teik Chan, Masafumi Hori, and Roel Gronheid, "Dual brush process for selective surface modification in graphoepitaxy directed self-assembly," Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460R (Presented at SPIE Advanced Lithography: March 01, 2017; Published: 27 March 2017); https://doi.org/10.1117/12.2259791.
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