High-χ block copolymers for directed self-assembly (DSA) patterning that do not need topcoat or solvent annealing have been developed. A variety of functionalities have been successfully added into the block copolymers, such as balanced surface energy between the polymer blocks, outstandingly high χ, tunable glass transition temperature (Tg), and selective crosslinking. Perpendicular orientation control, as desired for patterning, of the block copolymers can be simply achieved by thermal annealing due to the equal surface energy of the polymer blocks at the annealing temperatures, which allows avoiding solvent annealing or top-coat. The χ value can be tuned up to achieve L0 as low as 8-10 nm for lamellar-structured block copolymers and hole/pillar size as small as 5-6 nm for cylinder-structured block copolymers. The Tg of the block copolymers can be tuned to improve the kinetics of thermal annealing by enhancing the polymer chain mobility. Block-selective crosslinking facilitates the pattern transfer by mitigating pattern collapse during wet etching and improving oxygen plasma etching selectivity between the polymer blocks. This paper provides an introductory review of our high-χ block copolymer materials with various functionalities for achieving improved DSA performance.
Kui Xu, Mary Ann Hockey, Eric Calderas, Douglas Guerrero, Daniel Sweat, Jeffrey Fiehler, and Richard Daugherty, "High-χ block copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing," Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460U (Presented at SPIE Advanced Lithography: March 01, 2017; Published: 27 March 2017); https://doi.org/10.1117/12.2257354.
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