In our previous paper dealing with multi-patterning, we proposed a new indicator to quantify the quality of final wafer pattern transfer, called interactive pattern fidelity error (IPFE). It detects patterning failures resulting from any source of variation in creating integrated patterns. IPFE is a function of overlay and edge placement error (EPE) of all layers comprising the final pattern (i.e. lower and upper layers). In this paper, we extend the use cases with Via in additional to the bridge case (Block on Spacer). We propose an IPFE budget and CD budget using simple geometric and statistical models with analysis of a variance (ANOVA). In addition, we validate the model with experimental data. From the experimental results, improvements in overlay, local-CDU (LCDU) of contact hole (CH) or pillar patterns (especially, stochastic pattern noise (SPN)) and pitch walking are all critical to meet budget requirements. We also provide a special note about the importance of the line length used in analyzing LWR. We find that IPFE and CD budget requirements are consistent to the table of the ITRS’s technical requirement. Therefore the IPFE concept can be adopted for a variety of integrated structures comprising digital logic circuits. Finally, we suggest how to use IPFE for yield management and optimization requirements for each process.
Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Serge Biesemans, and Masashi Enomoto, "Pattern uniformity control in integrated structures," Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461B (Presented at SPIE Advanced Lithography: March 02, 2017; Published: 27 March 2017); https://doi.org/10.1117/12.2257868.
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