A pattern-based methodology for optimizing SADP-compliant layout designs is developed based on identifying cut
mask patterns and replacing them with pre-characterized fixing solutions. A pattern-based library of difficult-tomanufacture
cut patterns with pre-characterized fixing solutions is built. A pattern-based engine searches for matching
patterns in the decomposed layouts. When a match is found, the engine opportunistically replaces the detected pattern
with a pre-characterized fixing solution. The methodology was demonstrated on a 7nm routed metal2 block. A small
library of 30 cut patterns increased the number of more manufacturable cuts by 38% and metal-via enclosure by 13%
with a small parasitic capacitance impact of 0.3%.
Lynn T. - N. Wang, Uwe Paul Schroeder, and Sriram Madhavan, "Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing," Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 1014804 (Presented at SPIE Advanced Lithography: March 01, 2017; Published: 30 March 2017); https://doi.org/10.1117/12.2258061.
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