Efrain Altamirano-Sánchez, "Low-frequency roughness mitigation on N7/N5 fin patterning (Conference Presentation)," Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490A (Presented at SPIE Advanced Lithography: February 28, 2017; Published: 27 April 2017); https://doi.org/10.1117/12.2263468.5402356427001.
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