Laser Wake Field accelerated electrons need to exhibit a good beam-quality to comply with requirements of FEL or high brilliance Thomson Scattering sources, or to be post-accelerated in a further LWFA stage towards TeV energy scale. Controlling electron injection, plasma density profile and laser pulse evolution are therefore crucial tasks for high-quality e-bunch production. A new bunch injection scheme, the Resonant Multi-Pulse Ionization Injection (RMPII), is based on a single, ultrashort Ti:Sa laser system. In the RMPII the main portion of the pulse is temporally shaped as a sequence of resonant sub-pulses, while a minor portion acts as an ionizing pulse. Simulations show that high-quality electron bunches with energies in the range 265MeV −1.15GeV , normalized emittance as low as 0.08 mm·mrad and 0.65% energy spread can be obtained with a single 250 TW Ti:Sa laser system. Applications of the e-beam in high-brilliance Thomson Scattering source, including 1.5 - 26.4 MeV γ sources with peak brilliance up to 1 · 1028ph/(s · mm2 • mrad2 • 0.1%bw), are reported.
Paolo Tomassini, Luca Labate, Pasquale Londrillo, Renato Fedele, Davide Terzani, and Leonida A. Gizzi, "High-quality electron bunch production for high-brilliance Thomson Scattering sources," Proc. SPIE 10240, Laser Acceleration of Electrons, Protons, and Ions IV, 102400T (Presented at SPIE Optics + Optoelectronics: April 25, 2017; Published: 7 May 2017); https://doi.org/10.1117/12.2266938.
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Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon