Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of a large array of electrostatic microcolumns for our recent surface plasmon enhanced photoemission sources is optimized numerically. Because of the compactness, one million of microcolumns can be put within 1 cm2 area. To avoid the trade-off between resolution and throughput, each microcolumn has one beamlet and there is no crossing point between any of the beamlets. An aperture self-aligned fabrication process is developed to make the optimized microcolumns.
Zhidong Du, Chen Chen, and Liang Pan, "Electrostatic microcolumns for surface plasmon enhanced electron beamlets," Proc. SPIE 10346, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XV, 1034608 (Presented at SPIE Nanoscience + Engineering: August 06, 2017; Published: 25 August 2017); https://doi.org/10.1117/12.2273492.
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