We present a CMOS compatible fabrication technique to create micro/nanostructures on silicon and germanium surfaces for effective photon trapping and enhanced absorption. We achieved many times of absorption enhancement enabled by these photon trapping micro/nanostructures compared to bulk silicon and germanium counterparts. This method can lead to designing both highly efficient photovoltaics, ultra-fast photodetectors and highly sensitive photon counting devices with dramatically reduced device thickness. We also demonstrate that different fabrication techniques (dry etch, wet etch, and their combination) and different geometries of these micro/nanostructures can affect the ability and extent of the photon trapping and light manipulation in semiconductor.
Yang Gao, Hilal Cansizoglu, Soroush Ghandiparsi, Cesar Bartolo-Perez, Ekaterina Ponizovskaya Devine, Aly Elrefaie, Shih-yuan Wang, and M. Saif Islam, "Fabrication of effective photon trapping and light manipulating micro/nano structures," Proc. SPIE 10349, Low-Dimensional Materials and Devices 2017, 103490T (Presented at SPIE Nanoscience + Engineering: August 10, 2017; Published: 25 August 2017); https://doi.org/10.1117/12.2276503.
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