Understanding thin film oxidation is fundamental from a scientific point of view. There are many processes that benefit from oxidation, such as passivation or memristor formation. On the other hand, oxidation can be a burden, such as in metallic interconnects. Oxidation thermodynamics have been studied for a long time; however, oxidation kinetics in different time scales, oxidation environments and temperatures have yet to be fully understood. In this work we use a combination of simulations and nanoscale characterization to further investigate and understand oxidation kinetics. Results include self-aligned electroforming of selector/memristor structures and ways to control copper oxide formation.
Juan Jose Díaz León, David M. Fryaud, and Nobuhiko P. Kobayashi, "Study of thin film oxidation kinetics using a combination of simulations and advanced characterization (Conference Presentation)," Proc. SPIE 10349, Low-Dimensional Materials and Devices 2017, 1034910 (Presented at SPIE Nanoscience + Engineering: August 11, 2017; Published: 21 September 2017); https://doi.org/10.1117/12.2274809.5583354920001.
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