From Event: SPIE Optical Engineering + Applications, 2017
Recently, several upgraded ESRF beamlines have become operational. Some of them include Double Multilayer Monochromators (DMM) to reduce the heat load on downstream optics or to benefit from increased flux compared to crystal optics. In some cases the bandwidth of the DMM has to stay below 0.5%. Such multilayers require an elevated number of layers, materials with moderate electron density, and a coating uniformity close to 0.1%. These boundary conditions impose severe constraints on the performance of the deposition system. This work will highlight successful results and discuss persisting issues and potential approaches for technical improvements.
Ch. Morawe, D. Carau, and J.-Ch. Peffen, "Double multilayer monochromators for upgraded ESRF beamlines," Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 1038603 (Presented at SPIE Optical Engineering + Applications: August 08, 2017; Published: 23 August 2017); https://doi.org/10.1117/12.2273609.
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