From Event: SPIE Optical Engineering + Applications, 2017
To achieve high resolution and sensitivity on the nanometer scale, further development of X-ray optics is required. Although ex-situ metrology provides valuable information about X-ray optics, the ultimate performance of X-ray optics is critically dependent on the exact nature of the working conditions. Therefore, it is equally important to perform in-situ metrology at the optics’ operating wavelength (‘at-wavelength’ metrology) to optimize the performance of X-ray optics and correct and minimize the collective distortions of the upstream beamline optics, e.g. monochromator, windows, etc. Speckle-based technique has been implemented and further improved at Diamond Light Source. We have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach an accuracy of two nanoradians. The recent development of the speckle-based at-wavelength metrology techniques will be presented. Representative examples of the applications of the speckle-based technique will also be given – including optimization of X-ray mirrors and characterization of compound refraction lenses. Such a high-precision metrology technique will be extremely beneficial for the manufacture and in-situ alignment/optimization of X-ray mirrors for next-generation synchrotron beamlines.
Hongchang Wang, Tunhe Zhou, Yogesh Kashyap, and Kawal Sawhney, "Speckle-based at-wavelength metrology of x-ray optics at Diamond Light Source," Proc. SPIE 10388, Advances in Computational Methods for X-Ray Optics IV, 103880I (Presented at SPIE Optical Engineering + Applications: August 10, 2017; Published: 23 August 2017); https://doi.org/10.1117/12.2274781.
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