From Event: SPIE Optical Engineering + Applications, 2017
Ptychography was used to determine the focus of a Multilayer-Laue-Lens (MLL) at beamline 1-BM at the Advanced Photon Source (APS). The MLL had a record aperture of 102 microns with 15170 layers. The measurements were made at 12 keV. The focal length was 9.6 mm, and the outer-most zone was 4 nm thick. MLLs with ever larger apertures are under continuous development since ever longer focal lengths, ever larger working distances, and ever increased flux in the focus are desired. A focus size of 25 nm was determined by ptychographic phase retrieval from a gold grating sample with 1 micron lines and spaces over 3.0 microns horizontal distance. The MLL was set to focus in the horizontal plane of the bending magnet beamline. A CCD with 13.0 micron pixel size positioned 1.13 m downstream of the sample was used to collect the transmitted intensity distribution. The beam incident on the MLL covered the whole 102 micron aperture in the horizontal focusing direction and 20 microns in the vertical direction. 160 iterations of the difference map algorithm were sufficient to obtain a reconstructed image of the sample. The present work highlights the utility of a bending magnet source at the APS for performing coherence-based experiments. Use of ptychography at 1-BM on MLL optics opens the way to study diffraction-limited imaging of other hard x-ray optics.
Albert Macrander, Michael Wojcik, Jörg Maser, Nathalie Bouet, Raymond Conley, and Barry Lai, "Focus of a multilayer Laue lens with an aperture of 102 microns determined by ptychography at beamline 1-BM at the Advanced Photon Source," Proc. SPIE 10389, X-Ray Nanoimaging: Instruments and Methods III, 1038909 (Presented at SPIE Optical Engineering + Applications: August 07, 2017; Published: 7 September 2017); https://doi.org/10.1117/12.2272842.
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