The virtuous cycle of integrated-circuit (IC) technology advancement has resulted in the proliferation of information and communication technology with revolutionary economic and social impact. Advancements in lithography have been critical to sustaining Moore’s law over the past 50+ years. As the minimum feature size of an IC has been scaled down well below the wavelength of light used in the photolithographic process, however, the semiconductor industry has faced a growing challenge of continuing to increase the density of transistors at ever lower cost per transistor. This paper discusses a cost-effective method for defining sublithographic features that can help to extend the era of Moore’s Law.
Tsu-Jae King Liu, "Extending the era of Moore's Law," Proc. SPIE 10451, Photomask Technology, 1045102 (Presented at SPIE Photomask Technology and EUV Lithography: September 11, 2017; Published: 16 October 2017); https://doi.org/10.1117/12.2286671.
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