Roll-to-roll UV nanoimprint lithography (R2R-UV-NIL) gains increasing industrial interest for large-area nano- and microstructuring of flexible substrates. It combines the possibility of multi length scale and 2.5D patterning of a functional resist with a square meter per minute productivity.
The fabrication of micro- and nanooptic elements and systems nowadays can be named a classical application of batch NIL. However, large-area application fields like display, photovoltaics or solar cell markets ask for upscaling possibilities with respect to active area and throughput. The combination of direct laser lithography, step+repeat imprinting for shim fabrication and R2R reproduction even offers a much higher diversity of application fields. Free form lenses and mirrors, waveguiding units or complex light manipulating systems add new possibilities for customized photonic systems, security features or large area high-end decoration.
Within this talk we will present the possibilities of combining greyscale laser lithography and roller-based imprinting with functionalized high-k imprint resins and see how to produce meters-per-minute 2.5D optical features on flexible substrates.
Ursula Palfinger, Ladislav Kuna, Dieter Nees, Stephan Ruttloff, Johannes Götz, and Barbara Stadlober, "R2R fabrication of freeform micro-optics (Conference Presentation)," Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105200J (Presented at SPIE LASE: January 31, 2018; Published: 14 March 2018); https://doi.org/10.1117/12.2295784.5751457656001.
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Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon