LCDU (Local Critical Dimension Uniformity) is one of the biggest challenges in EUV lithography as well as throughput. High contrast illumination, so called, leaf hexapole illumination is proposed for staggered contact-hole array pattern. Leaf hexapole illumination shows much better LCDU compared with traditional hexapole illumination which has been used in DUV lithography so far. Stochastic noise model which was developed based on the particle nature of photon is updated to supplement a missing term. Model prediction is well matched with experimental results in wide range of wafer CD and mask CD. Further optimization of LCDU and/or dose-to-size can be predicted through mask CD optimization. By using illumination optimization and mask CD optimization technique, EUV single exposure process can be applied below D1z node or beyond.
Mijung Lim, Chang-Moon Lim, Chang-Nam Ahn, Daniel Park, Anita Fumar-Pici, and Nak Seong, "EUV contact-hole local CD uniformity optimization for DRAM storage node application," Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830X (Presented at SPIE Advanced Lithography: February 28, 2018; Published: 1 May 2018); https://doi.org/10.1117/12.2299322.
Conference Presentations are recordings of oral presentations given at SPIE conferences and published as part of the conference proceedings. They include the speaker's narration along with a video recording of the presentation slides and animations. Many conference presentations also include full-text papers. Search and browse our growing collection of more than 14,000 conference presentations, including many plenary and keynote presentations.
Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon