We present performance characterization for KMLabs’ high harmonic generation (HHG) -based 13.5 nm EUV source, the XUUS4 TM. This source meets critical specifications for metrology and imaging applications, including in its long-term stability, and has been applied to ultrahigh resolution coherent diffractive imaging at 13.5 nm.
Xiaoshi Zhang, Jon Garlick, Eric Mountfort, and Henry Kapteyn, "A tabletop coherent EUV source for commercial EUVL metrology and imaging applications," Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831C (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 19 March 2018); https://doi.org/10.1117/12.2297507.
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Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon