Technologies for pattern fabrication using imprint process are being developed for various devices. Nanoimpirnt lithography (NIL) is an attractive and promising candidate for its pattern fidelity toward finer device fabrication without using double patterning. Layout and process dependent hotspots become a significant issue for application in smaller pattern size device and, design for manufacturing (DFM) flow comprising imprint process has to be prepared. Focusing on resist drop arrangement method as a process margin expansion knob, simulated non-fill defect is compared with experimental result. Finally, drop arrangement-related hot-spot extraction/modification flow utilizing total NIL simulation is proposed.
Sachiko Kobayashi, Kyoji Yamashita, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Ji-Young Im, Takuya Kono, and Tetsuro Nakasugi, "Design for nanoimprint lithography: hot spot modification through total NIL process simulation," Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840R (Presented at SPIE Advanced Lithography: February 28, 2018; Published: 19 March 2018); https://doi.org/10.1117/12.2297361.
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