We will introduce SCIL as a full-wafer soft-stamp base nanoimprint technique with the advantages of being able to replicate sub-10nm features and perform overlay alignment with sub-micron precision over 200mm wafers. The combination of PDMS based soft stamps and an inorganic crosslinking imprint resist leads to a very long stamp lifetime of over 700 imprints, as demonstrated in the AutoSCIL 200 high volume production tool. Initial applications for wafer based NIL mainly required only a single, first mask, patterning step. For optical applications high refractive index material which can be directly patterned with high fidelity and low shrinkage are desired and initial results of inorganic resists that reach a refractive index of n=1.8 are demonstrated. As NIL and the applications develop, overlay alignment is the next step. Here we will discuss the developments ongoing to integrate wafer scale overlay alignment in the AutoSCIL production platform and which would achieve ~1 micrometer overlay alignment over 200mm wafers. Two applications that make use of the ability of NIL to replicate large area nano-patterns (X-ray mirrors) and the combination of micro- and sub-20nm patterns in one layer / pattern (cell proliferation templates) are discussed.
Marc A. Verschuuren, Jake McCoy, Rebecca P. Huber, Remco van Brakel, Manuel Paans, and Rob Voorkamp, "AutoSCIL 200mm tooling in production, x-ray optics, and cell growth templates," Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840Z (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 19 March 2018); https://doi.org/10.1117/12.2297445.
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