With the advent of high brightness sources and fast detectors, there is a possibility for combining fast X-ray acquisition with high-speed data treatment to reach the timescale for an effective in-line characterization method. We will highlight two recent developments using Small Angle X-ray Scattering on nanoscale etched patterns: the first is the inclusion of a CD-SAXS tool, allowing the data treatment and simulations to reconstruct the form-factor, inside the Xi-cam framework; the second is the development of a high performance Grazing Incidence approach to reconstruct the shape of line profile. This study also shows the comparison between the line profiles reconstructed from both techniques as well as the profile extracted from cross-section SEM.
G. Freychet, D. Kumar, R. Pandolfi, D. Staacks, P. Naulleau, R. J. Kline, D. Sunday , M. Fukuto, J. Strzalka, and A. Hexemer, "Critical-dimension grazing incidence small angle x-ray scattering," Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058512 (Presented at SPIE Advanced Lithography: February 28, 2018; Published: 13 March 2018); https://doi.org/10.1117/12.2297518.
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