Immersion lithography is being extended beyond the 10-nm node and the lithography performance requirement needs to be tightened further to ensure good yield. Amongst others, good on-product focus control with accurate and dense metrology measurements is essential to enable this. In this paper, we will present new solutions that enable onproduct focus monitoring and control (mean and uniformity) suitable for high volume manufacturing environment. We will introduce the concept of pure focus and its role in focus control through the imaging optimizer scanner correction interface. The results will show that the focus uniformity can be improved by up to 25%.
Junghun Oh, Kwang-Seok Maeng , Jae-Hyung Shin, Won-Woong Choi, Sung-Keun Won, Cedric Grouwstra, Mohamed El Kodadi, Stephan Heil, Vidar van der Meijden, Jong Kyun Hong , Sang-Jin Kim, and Oh-Sung Kwon, "Scanner focus metrology and control system for advanced 10nm logic node," Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851O (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 13 March 2018); https://doi.org/10.1117/12.2297442.
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