Lamellar CD-SEM image analysis is one of the key step for the development of new polymer formulations. We present in this paper a new approach for the analysis of lamellar CD-SEM that can be extended to any type of other pattern (contact…) with a machine learning approach. We will also focus on the roughness analysis and specifically the Line Edge Roughness (LER) and Power Spectral Density (PSD) with a robust estimation that takes into account curvature of the line. The last part is dedicated to the introduction of a process optimisation technique using machine learning to optimize process parameters from a first design of experiment.
G. Bernard, X. Chevalier, A. Dervilllé, and J. Foucher, "Automated lamellar block copolymer process characterization ," Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105860Z (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 19 March 2018); https://doi.org/10.1117/12.2297347.
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