Biopolymers represent natural, renewable and abundant materials. Their use is steadily growing in various areas (food, health, building …) but, in lithography, despite some works, resists, solvents and developers are still oil-based and hazardous chemicals. In this work, we replaced synthetic resist by chitosan, a natural, abundant and hydrophilic polysaccharide. High resolution sub-micron patterns were obtained through chitosan films as water developable, chemically unmodified, positive tone mask resist for an eco-friendly electron beam and deep-UV (193 nm) lithography process. Sub-micron patterns were also successfully obtained using a 248 nm photomasker thanks to the addition of biosourced photoactivator, riboflavin. Patterns were then transferred by plasma etching into silica even for high resolution patterns.
Mathieu Caillau, Céline Chevalier, Pierre Crémillieu, Thierry Delair, Olivier Soppera, Benjamin Leuschel, Cédric Ray, Christophe Moulin, Christian Jonin, Emmanuel Benichou, Pierre-François Brevet, Christelle Yeromonahos, Emmanuelle Laurenceau, Yann Chevolot, and Jean-Louis Leclercq, "Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography ," Proc. SPIE 10587, Optical Microlithography XXXI, 105870S (Presented at SPIE Advanced Lithography: February 28, 2018; Published: 20 March 2018); https://doi.org/10.1117/12.2292312.
Conference Presentations are recordings of oral presentations given at SPIE conferences and published as part of the conference proceedings. They include the speaker's narration along with a video recording of the presentation slides and animations. Many conference presentations also include full-text papers. Search and browse our growing collection of more than 14,000 conference presentations, including many plenary and keynote presentations.
Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon