DUV ArF immersion lithography requires patterning budget improvements in the range of 1/10 nm especially for interconnect layers for advanced process nodes. As every angstrom counts, the Cymer XLR 860ix light source has been developed to deliver the performance required for multiple patterning processes across all sectors: DRAM, 3D NAND, and logic. This paper will describe how imaging margins can be increased by optimizing light source bandwidth settings. Advancements include new hardware and software that enable industry leading bandwidth performance and control. In addition, on-wafer measurements were collected showing the progressive improvements gained with lowering bandwidth on an existing mask.
As system availability is a key enabler for chipmakers, the introduction of this new DUV light source includes improvements that continue to improve productivity by increasing service intervals by >30% while also providing sustainability enhancements.
Theodore Cacouris, Josh Thornes, Marc Sells, Aleks Simic, and Will Conley, "Advanced light source technologies for memory and logic processes (Conference Presentation)," Proc. SPIE 10587, Optical Microlithography XXXI, 105870Y (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 20 March 2018); https://doi.org/10.1117/12.2298431.5754392173001.
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Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon