Printing cut mask in SAMP (Self Aligned Multi Patterning) is very challenging at advanced nodes. One of the proposed solutions is to print the cut shapes selectively. Which means the design is decomposed into mandrel tracks, Mandrel cuts and non-Mandrel cuts. The mandrel and non-Mandrel cuts are mutually independent which results in relaxing spacing constrains and as a consequence more dense metal lines. In this paper, we proposed the manufacturing flow of selective etching process. The results are quantified in terms of measuring PVBand, EPE and the number of hard bridging and pinching across the layout.
Rehab Kotb Ali, Ahmed Hamed Fatehy, and James Word, "Integrated manufacturing flow for selective-etching SADP/SAQP," Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880Q (Presented at SPIE Advanced Lithography: March 01, 2018; Published: 20 March 2018); https://doi.org/10.1117/12.2297415.
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