That paper focuses on diffraction gratings consisting some period failures provided by the errors of the electronbeam lithography method. Samples of lithographic phase gratings were tentatively analyzed to describe that technological errors. A small linear modulation of the period or a joint of a frame edges can cause not only diffraction efficiency losses but also functional breakdown. A simulation of the diffraction of a monochromatic wave at the described diffraction phase structures is carried out. Described diffraction gratings have interest in field of linear displacement encoders.
M. V. Shishova, A. Y. Zherdev, S. B. Odinokov, and D. S. Lushnikov, "Lithographic diffraction grating with a period failure," Proc. SPIE 10678, Optical Micro- and Nanometrology VII, 106780E (Presented at SPIE Photonics Europe: April 25, 2018; Published: 24 May 2018); https://doi.org/10.1117/12.2306811.
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