Chiral Plasmonics is a new and hot research topics, which studies the different in optical responses to the incident light with different handedness. Many new and exciting concepts have been reported in the literature; however, fabrication of these chiral nanostructures is not an easy task. It is especially hard to fabricate three-dimensional chiral nanostructures that cover large area and with high enough throughput. In this study, we will demonstrate he fabrication of various chiral nanostructures using a method combining various nanofabrication technique, including Nanospherical-Lens Lithography (NLL), Nano-Stencil Lithography (NSL) and Hole Mask Lithography (HML). NLL is a technique that has been developed in our group for years and has been demonstrated to be able to integrated with HML to fabricated complicated nanostructures. In this investigation, we study the possibility to integrated the NSL and the HML so we are able to fabricate more nanostructures that can not be fabricated using NLL. Finally, we will investigate the optical properties of the fabricated chiral nanostructures using three-dimensional finite difference time-domain method. Experimental measurements will also be performed to understand the actual optical properties of the fabricated nanostructures. In the end, we will use these chiral nanostructures to detect some chiral molecules.

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Chia-Yi Lin, Yu-Yu Chen, Chang-Han Wang, Kuan-Yu Chiu, Zhi-Yen Liu, Shih-Hui Chang, and Yun-Chorng Chang, "Large-scale chiral nanostructures fabricated using high-throughput nanofabrication methods (Conference Presentation)," Proc. SPIE 10722, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XVI, 107221W (Presented at SPIE Nanoscience + Engineering: August 23, 2018; Published: 17 September 2018); https://doi.org/10.1117/12.2320903.5836038589001.